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Studies of the optical and structural properties of ion-assisted deposited $Al_20_3$ thin films

Al-Robaee, Mansour S and Subbanna, GN and Rao, Narasimha K and Mohan, S (1994) Studies of the optical and structural properties of ion-assisted deposited $Al_20_3$ thin films. In: Vacuum, 45 (1). pp. 97-102.

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Abstract

The optical and structural properties of $Al_20_3$ films produced by oxygen-ion assisted deposition (IAD) have been investigated as a function of ion energy (300-7000 eV), ion current density $(50-220 \mu A \hspace {2mm} cm^{-2})$, and substrate temperature (ambient-300°C). It is observed that films prepared by IAD with the substrates maintained at elevated temperatures show the best properties. The maximum refractive index obtained was 1.73 for films deposited at 1000 eV, $50 \mu A \hspace {2mm} cm^{-2}$ and 300°C. The refractive index decreased with increase in ion current density for ion energies exceeding 300 eV with absorption still being negligible. As-deposited films prepared, with or without ion bombardment, were amorphous. Films deposited without ions and annealed at 800°C in air for 72 h were y- alumina, whereas those deposited at 1000 eV ion energy, $220 \mu A \hspace {2mm} cm^{-2}$ ion current density and annealed at the same temperature for the same period were found to be \alpha-alumina.

Item Type: Journal Article
Additional Information: The copyright of this article belongs to Elsevier.
Department/Centre: Division of Physical & Mathematical Sciences > Instrumentation and Applied Physics (Formally ISU)
Division of Chemical Sciences > Materials Research Centre
Date Deposited: 22 Nov 2006
Last Modified: 19 Sep 2010 04:30
URI: http://eprints.iisc.ernet.in/id/eprint/8054

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