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Transmission electron microscopic study of GaAs/Ge heterostructures grown by low-pressure metal organic vapor phase epitaxy

Hudait, Mantu Kumar and Krupanidhi, SB (2000) Transmission electron microscopic study of GaAs/Ge heterostructures grown by low-pressure metal organic vapor phase epitaxy. In: Materials Research Bulletin, 35 (1). pp. 125-133.

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Abstract

GaAs/Ge heterostructures were grown under different growth conditions by low-pressure metal organic vapor phase epitaxy (LP-MOVPE) and investigated by transmission electron microscopy (TEM). Abrupt heterointerface and antiphase domain (APD)-free single domain GaAs epilayers on Ge substrates were achieved under specific growth conditions. The lattice indexing of high-resolution transmission electron microscopy (HRTEM) exhibited excellent lattice line matching between the GaAs epilayer and the Ge substrate. These results led us to conclude that the optimal growth parameters for achieving high-quality GaAs/Ge heterostructure are As/Ga ratio of ~88:1, growth rate of ~3 $\mu m/h$, and growth temperature of 675°C.

Item Type: Journal Article
Additional Information: Copyright of this article belongs to Elsevier.
Keywords: A.Thin films;A.Semiconductors;B.Epitaxial growth;C.Electron microscopy;D.Defects
Department/Centre: Division of Chemical Sciences > Materials Research Centre
Date Deposited: 01 Sep 2006
Last Modified: 19 Sep 2010 04:30
URI: http://eprints.iisc.ernet.in/id/eprint/8127

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