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Microstructure and composition analysis of $Cu-Cu_20$ cermet films deposited by d.c. reactive magnetron sputtering

Rao, Mohan G and Mohan, S and Panchapagesan, TS and Balasubramanian, TV (1992) Microstructure and composition analysis of $Cu-Cu_20$ cermet films deposited by d.c. reactive magnetron sputtering. In: Thin Solid Films, 207 (1-2). pp. 29-32.

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Abstract

Microstructure and composition analyses of thin films are important in correlating the properties to the process parameters. In this paper, we discuss the details of such analyses of cermet films of copper and its oxide prepared by a d.c. reactive magnetron sputtering technique. The films were found to be homogeneous across the thickness. Electron microscopy coupled with an image analysis system was used in estimating the volume fraction of the metal in the deposited films. The metal content in the films varied from 0.88 to 0.15 depending on the deposition rate of the metal and the oxygen partial pressure. Magnetron sputtering was shown to be very effective in controlling the composition of the cermet films.

Item Type: Journal Article
Additional Information: Copyright of this article belongs to Elsevier.
Department/Centre: Division of Physical & Mathematical Sciences > Instrumentation and Applied Physics (Formally ISU)
Division of Chemical Sciences > Materials Research Centre
Division of Mechanical Sciences > Mechanical Engineering
Date Deposited: 26 Sep 2006
Last Modified: 19 Sep 2010 04:30
URI: http://eprints.iisc.ernet.in/id/eprint/8197

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