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Studies on structural and electrical properties of spray deposited $SnO_2:F$ thin films as a function of film thickness

Elangovan, E and Singh, MP and Ramamurthi, K (2004) Studies on structural and electrical properties of spray deposited $SnO_2:F$ thin films as a function of film thickness. In: Materials Science and Engineering B, 113 (2). pp. 143-148.

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Abstract

Thin films of fluorine-doped tin oxide $(SnO_2:F)$ on glass were prepared by spray pyrolysis technique from an economic stannous chloride $(SnCl_2)$ precursor. In order to find out the effect of solution concentration on growth of the films, these films were prepared using different precursor concentrations. In the present paper we report the thickness dependent properties of $SnO_2:F$ films. X-ray diffraction(XRD) studies revealed that the preferred orientation of the films varies with the film thickness and are reflected in scanning electron microscope (SEM)studies as they showed different grain shapes. The minimum sheet resistance $(3.2\Omega\sqcup)$ achieved in the present study was found to be the lowest among the earlier reported values for these films prepared from $SnCl_2$ precursor. The possibility of various scattering mechanisms as to be a dominant factor in limiting the mobility of charge carriers has been analysed

Item Type: Journal Article
Additional Information: The copyright of this article belongs to Elsevier.
Keywords: Tin oxide thin films;Spray pyrolysis;SnCl2 precursor;Fluorine doping and structural properties
Department/Centre: Division of Chemical Sciences > Materials Research Centre
Date Deposited: 19 Feb 2007
Last Modified: 19 Sep 2010 04:31
URI: http://eprints.iisc.ernet.in/id/eprint/8533

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