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Hopping conduction in boron doped amorphous carbon films

Vishwakarma, PN and Subramanyam, SV (2006) Hopping conduction in boron doped amorphous carbon films. In: Journal of Applied Physics, 100 (11). 113702-1-113702-5.

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Abstract

The electrical transport properties of boron doped graphitelike amorphous carbon films have been studied. Variable range hopping (VRH) conduction is found to be the conduction mechanism in these carbon films. The conduction in high temperature regime follows the Mott VRH [J. Non-Cryst. Solids 1, 1 (1968)], whereas a crossover from the Mott [Electronic Process in Non-crystalline Materials (Clarendon, Oxford, 1971)] to the Efros-Shklovskii [J. Phys. C 8, L49 (1975)] VRH is observed at low temperatures. Additional support to this transition is evident from negative magnetoresistance in VRH regime when the sample is deep inside the insulating side of the metal insulator transition. Various calculated parameters such as localization length, density of states at the Fermi level, and Coulomb gap for insulating samples have been estimated from the experimental data. The density of states at the Fermi level shows a gradual shift with a corresponding variation in boron doping level, indicating a change in the density of conducting \pi electrons due to substitutional doping of boron in the carbon network.

Item Type: Journal Article
Additional Information: Copyright of this article belongs to American Institute of Physics.
Department/Centre: Division of Physical & Mathematical Sciences > Physics
Date Deposited: 07 Mar 2007
Last Modified: 19 Sep 2010 04:34
URI: http://eprints.iisc.ernet.in/id/eprint/9563

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