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Structural and optical properties of polycrystalline thin films of rare earth oxides grown on fused quartz by low pressure MOCVD

Singh, MP and Shivashankar, SA (2005) Structural and optical properties of polycrystalline thin films of rare earth oxides grown on fused quartz by low pressure MOCVD. In: Journal of Crystal Growth, 276 (1-2). pp. 148-157.

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Abstract

We report the structural and optical properties of oriented polycrystalline thin films of rare earth oxides (REO), namely $Er_2O_3$, $Gd_2O_3$, $Eu_2O_3$, and $Yb_2O_3$ grown on fused quartz by low-pressure metalorganic chemical vapour deposition (MOCVD) in the temperature range of $450-800^0C$, using adducted $_\beta$-diketonate complexes of rare earth metals as precursors. The films were characterized by X-ray diffraction (XRD) and UV–visible spectrophotometry. While the films grown at low temperatures $(\sim500 ^oC)$ are poorly crystalline, those grown on or above $525 ^oC$ display a significant (1 1 1) texture. Growth of textured cubic REO in (1 1 1) direction on amorphous substrate is interpreted in terms of minimization of surface energy at the film–substrate interface. The degree of misfit between the interatomic distances in the disordered fused quartz substrate and those in the crystalline REO is invoked to explain the presence (absence) of low-intensity reflections other than (1 1 1). The incorporation of carbon (from the precursor) into the films affects the optical properties of REO, as examined by UV–visible spectroscopy.

Item Type: Journal Article
Additional Information: Copyright of this article belongs to Elsevier.
Keywords: A1.Disordered substrate;A3.Metalorganic chemical vapor deposition;A3.Texture;A3.Thin films;B1.Rare earth oxides
Department/Centre: Division of Chemical Sciences > Materials Research Centre
Date Deposited: 09 Apr 2007
Last Modified: 19 Sep 2010 04:35
URI: http://eprints.iisc.ernet.in/id/eprint/9740

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