Mohan, S and Krishna, Ghanashyam M (1995) A review of ion beam assisted deposition of optical thin films. In: Vacuum, 46 (7). pp. 645-659.
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A review of the current status of ion assisted deposition of optical thin films is presented. The different kinds of ion sources and their relative merits and demerits are discussed. This is followed by a discussion of the various theoretical models currently in use to explain ion-surface interactions in such a process and finally the properties of oxide thin films deposited using ion assisted deposition are discussed.
|Item Type:||Journal Article|
|Additional Information:||Copyright of this article belongs to Pergamon.|
|Department/Centre:||Division of Physical & Mathematical Sciences > Instrumentation and Applied Physics (Formally ISU)|
|Date Deposited:||27 Jun 2007|
|Last Modified:||31 Mar 2011 11:01|
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