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Studies of process parameter controlled composition variation in sputtered $YBa_2Cu_3O_{7-x}$ films

Nathan, Senthil S and Muralidhar, GK and Rao, Mohan G and Mohan, S (1997) Studies of process parameter controlled composition variation in sputtered $YBa_2Cu_3O_{7-x}$ films. In: Vacuum, 48 (2). pp. 113-118.

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Abstract

$YBa_2Cu_30_{7_X}$ films have been deposited on (100) MgO substrates by a high pressure oxygen sputtering technique. Optical emission spectroscopic study of the sputter plasma indicates that the sputtered species are atomic in nature. Based on the atomic nature of the sputtered species, a model has been used to estimate the atomic flux of different constituents reaching the substrate considering the thermalisation and diffusion of the sputtered atoms. The change in composition of the films deposited with different inter-electrode spacing from 15 to 20mm and sputtering pressure in the range 1.O-2.6mbar has been explained on the basis of atomic flux of constituent atoms reaching the substrate and resputtering rates of individual constituents from the deposited films. The reasons for realising films with stoichiometric composition at a pressure 2.0mbar and inter-electrode distance 79mm have been explained on the basis of the above model.

Item Type: Journal Article
Additional Information: Copyright of this article belongs to Elsevier.
Department/Centre: Division of Physical & Mathematical Sciences > Instrumentation and Applied Physics (Formally ISU)
Date Deposited: 21 Mar 2007
Last Modified: 19 Sep 2010 04:35
URI: http://eprints.iisc.ernet.in/id/eprint/9813

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