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Number of items: 6.

Devi, A and Shivashankar, SA and Samuelson, AG (2002) MOCVD of aluminium oxide films using aluminiurn beta-diketonates as precursors. In: Journal de Physique IV - Proceedings, 12 (PR4). 139-146 .

Mane, Anil U and Shalini, K and Wohlfart, A and Devi, A and Shivashankar, SA (2002) Strongly oriented thin films of $Co_3O_4$ deposited on single-crystal MgO(1 0 0) by low-pressure, low-temperature MOCVD. In: Journal of Crystal Growth, 240 (1-2). pp. 157-163.

Singh, MP and Mukhopadhayay, S and Devi, A and Shivashankar, SA (2001) A study of nucleation and growth in MOCVD: The growth of thin films of alumina. In: Growth, Evolution and Properties of Surfaces, Thin Films and Self-Organized Strutures, Nov 27-Dec 1 2000, Boston, MA, P6471-P6476.

Patnaik, S and Row, TNG and Raghunathan, L and Devi, A and Goswami, J and Shivashankar, SA and Chandrasekaran, S and Robinson, WT (1996) Low-temperature structure of two copper-based precursors for MOCVD: Aquabis(tert-butyl acetoacetato)copper(II) and Bis(dipivaloylmethanido)copper(II). In: Acta Crystallographica Section C, 52 (part 4). pp. 891-894.

Goswami, J and Raghunathan, L and Devi, A and Shivashankar, SA and Chandrasekaran, S (1996) Chemical vapour deposition of thin copper films using a new metalorganic precursor. In: Journal of Materials Science Letters, 15 (7). pp. 573-575.

Goswami, J and Shivashankar, SA and Raghunathan, L and Devi, A and Ramanathan, KV (1994) Comparison of growth and microstructure of copper films deposited from different Cu(II) precursors. In: Advanced Metallization for Devices and Circuits—Science Technology and Manufacturing III, 4-8 April 1994, Pittsburgh, PA, USA, pp. 691-696.

This list was generated on Mon Nov 24 09:57:07 2014 IST.