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Conference Proceedings

Mukhopadhyay, S and Mitra, S and Ding, YM and Ganapathi, KL and Misra, D and Bhat, N and Tapily, K and Clark, RD and Consiglio, S and Wajda, CS and Leusink, GJ (2016) Effect of Post Plasma Oxidation on Ge Gate Stacks Interface Formation. In: International Symposium on Silicon Compatible Materials, Processes, and Technologies for Advanced Integrated Circuits and Emerging Applications 6 held as a part of the 229th Meeting of The Electrochemical-Society , MAY 29-JUN 02, 2016, San Diego, CA, pp. 303-312.

Conference Paper

Bujjamma, J and Ganapathi, KL and Mohan, S (2009) Ion Assisted Deposition of HfO2 thin films for CMOS gate dielectric applications. In: Oral presentation in ICMAT-2009.

Journal Article

Gangavarapu, Yasasvi PR and Sharma, Anjanashree Mankala Ramakrishna and Ganapathi, KL and Mohan, Sangeneni and Naik, AK (2019) Dielectric based charge carrier tuning for CNT CMOS inverters. In: SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 34 (1).

This list was generated on Mon Feb 17 17:45:31 2020 IST.