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Number of items: 6.

Conference Paper

Goswami, J and Ananthakrishna, G and Shivashankar, SA (1997) Monte Carlo simulation of nucleation and growth of thin films. In: India-Japan Seminar on New Materials, 21-22 Oct. 1996, Hyderbad, India, pp. 823-843.

Goswami, J and Shivashankar, SA and Raghunathan, L and Devi, A and Ramanathan, KV (1994) Comparison of growth and microstructure of copper films deposited from different Cu(II) precursors. In: Advanced Metallization for Devices and Circuits—Science Technology and Manufacturing III, 4-8 April 1994, Pittsburgh, PA, USA, pp. 691-696.

Journal Article

Devi, Anjana and Goswami, J and Lakshmi, R and Shivashankar, SA and Chandrasekaran, S (1998) A novel Cu(II) chemical vapor deposition precursor: Synthesis, characterization, and chemical vapor deposition. In: Journal of Materials Research, 13 (3). pp. 687-692.

Goswami, J and Shivashankar, SA and Anathakrishna, G (1997) Effects of reaction kinetics on the microstructure of chemical vapour deposited copper films: experiment and simulation. In: Thin Solid Films, 305 (1-2). pp. 52-60.

Patnaik, S and Row, TNG and Raghunathan, L and Devi, A and Goswami, J and Shivashankar, SA and Chandrasekaran, S and Robinson, WT (1996) Low-temperature structure of two copper-based precursors for MOCVD: Aquabis(tert-butyl acetoacetato)copper(II) and Bis(dipivaloylmethanido)copper(II). In: Acta Crystallographica Section C, 52 (part 4). pp. 891-894.

Goswami, J and Raghunathan, L and Devi, A and Shivashankar, SA and Chandrasekaran, S (1996) Chemical vapour deposition of thin copper films using a new metalorganic precursor. In: Journal of Materials Science Letters, 15 (7). pp. 573-575.

This list was generated on Sat Dec 20 09:07:49 2014 IST.