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Journal Article

Rao, KSRK and Katayama, T and Yokoyama, S and Hirose, M (2000) Optimum atomic spacing for AlAs etching in GaAs epitaxial lift-off technology. In: Japanese Journal of Applied Physics, 39 (5B). L457-L459.

This list was generated on Fri Oct 24 13:57:21 2014 IST.