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Journal Article

Anand, Venu and Nair, Aswathi R and Shivashankar, SA and Rao, Mohan G (2015) Atmospheric pressure plasma chemical vapor deposition reactor for 100 mm wafers, optimized for minimum contamination at low gas flow rates. In: APPLIED PHYSICS LETTERS, 107 (9).

This list was generated on Tue Sep 17 01:45:06 2019 IST.