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Singh, MP and Thakur, CS and Shalini, K and Shripathi, T and Bhat, N and Shivashankar, SA (2004) A comparative study of erbium oxide and gadolinium oxide high-k dielectric thin films grown by low-pressure metalorganic chemical vapour deposition (MOCVD) using beta-Diketonates as precursors. In: 2nd International Symposium on High Dielectrics Constant Materials, OCT 12-16, 2003, Orlando, FL.
Singh, MP and Thakur, CS and Bhat, N and Shivashankar, SA (2003) A Study of $Al_2O_3$ :C Films on Si(100) Grown by Low Pressure MOCVD. In: Novel Materials and Processes for Advanced CMOS. Symposium, Novel Materials and Processes for Advanced CMOS. Symposium, Boston, MA, USA, pp. 349-54.
Singh, MP and Thakur, CS and Shalini, K and Banerjee, S and Bhat, N and Shivashankar, SA (2004) Structural, optical, and electrical characterization of gadolinium oxide films deposited by low-pressure metalorganic chemical vapor deposition. In: Journal of Applied Physics, 96 (10). pp. 5631-5637.
Singh, MP and Thakur, CS and Shalini, K and Bhat, N and Shivashankar, SA (2003) Structural and electrical characterization of erbium oxide films grown on Si(100) by low-pressure metalorganic chemical vapor deposition. In: Applied Physics Letters, 83 (14). pp. 2889-2891.
Singh, MP and Thakur, CS and Bhat, N and Shivashankar, SA (2002) A study of Al2O3:C films on Si(100) grown by low pressure MOCVD. In: MRS Proceedings, 745 . N9.2 -T7.2.
